Design of high performance chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 174-185

  Niinomi, Takaaki ^a   Tomiyasu, Hiroshi ^a   Kameyama, Yasuhiro ^a   Tsukamoto, Michinori ^a   Tanaka, Yuki ^a   Fujita, Jun ^a   Shimomura, Satoshi ^a   Ochiai, Tameichi ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; DISSOLUTION; FILMS; LITHOGRAPHY; MICROELECTRONICS; PERFORMANCE;

CHEMICALLY AMPLIFIED RESISTS; POST EXPOSURE DELAY; TRISPHENOL;

PHOTORESISTS;

EID: 0029727691     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241815     Document Type: Conference Paper

References (6)