PEB model with cross-diffusion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1098-1104

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Acid diffusion; Acid transport; CAR; Lithography; PEB; Post exposure baking

Indexed keywords

ACIDS; CALIBRATION; DEGREES OF FREEDOM (MECHANICS); DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; REACTION KINETICS; THERMODYNAMIC PROPERTIES; TRANSPORT PROPERTIES;

CROSS DIFFUSION; ONSAGER COEFFICIENT;

LITHOGRAPHY;

EID: 0141834065     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.488801     Document Type: Conference Paper

References (5)

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2. M. Zuniga, A.R. Neureuther, "Reaction-Diffusion Modeling and Simulations in Positive DUV Resists", J. Vac. Sci. Technol., B, vol. 13, pp.2957-2962, November/December 1995.
3. M. Zuniga, G. Wallraff, E. Tomacruz, B. Smith, C. Larson, W. D. Hinsburg, A. R. Neureuther, "Simulation of locally enhanced three-dimensional diffusion in chemically amplified resists", J. Vac. Sci. Technol., B, Nov-Dec vol. 11(6), pp. 2862-2866, 1993.
4. J.M. Honig, Thermodynamics, Academic Press, 608 p, 1999.
5. S. Postnikov, Transport Properties of Photogenerated Acid and Silytating Agent in Polymer Films. Ph.D. Dissertation, The University of Texas at Austin, 1999.