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Volumn 4690 II, Issue , 2002, Pages 690-702

Evaluation of resist-film property for CD control

Author keywords

CD control; Film property; KrF resist; Rmin; Solvent concentration

Indexed keywords

AMPLIFICATION; CORRELATION METHODS; DATA ACQUISITION; SILICON WAFERS; SOLVENTS;

EID: 0036029182     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474269     Document Type: Conference Paper
Times cited : (4)

References (4)
  • 1
    • 0043276046 scopus 로고
    • Dissolution characteristics optimization of chemically amplified positive resist
    • Toru Yamaguchi, Haruo Iwasaki, Masashi Fujimoto and Kunihiko Kasama, "Dissolution Characteristics Optimization of Chemically Amplified Positive Resist", Proc. SPIE 2195, 126(1994).
    • (1994) Proc. SPIE , vol.2195 , pp. 126
    • Yamaguchi, T.1    Iwasaki, H.2    Fujimoto, M.3    Kasama, K.4
  • 2
    • 0032662531 scopus 로고    scopus 로고
    • Correlations between dissolution data and lithography of various resists
    • Ronald DellaGuardia, Wu-Song Huang, Rex Chen, Doris Kang, "Correlations Between Dissolution Data And Lithography of Various Resists", Proc. SPIE 3678, 316(1999).
    • (1999) Proc. SPIE , vol.3678 , pp. 316
    • DellaGuardi, R.1    Huang, W.-S.2    Chen, R.3    Kang, D.4
  • 3
    • 0043276046 scopus 로고
    • Dissolution characteristics optimization of chemically amplified positive resist
    • Toshiro Itani, Haruo Iwasaki, Masashi Fujimoto and Kunihiko Kasama, "Dissolution Characteristics Optimization of Chemically Amplified Positive Resist", Proc. SPIE 2195, 126(1994).
    • (1994) Proc. SPIE , vol.2195 , pp. 126
    • Itani, T.1    Iwasaki, H.2    Fujimoto, M.3    Kasama, K.4
  • 4
    • 0032686704 scopus 로고    scopus 로고
    • Effects of polymer structure on dissolution characteristics in chemically amplified 193 resists
    • Toshiro Itani, Hiroshi Yoshino, Masaharu Takizawa, Mitsuharu Yamana, Hiroshi Tanabe and Kunihiko Kasana, "Effects of Polymer Structure on Dissolution Characteristics in Chemically Amplified 193 Resists", Proc. SPIE 3678, 306(1999).
    • (1999) Proc. SPIE , vol.3678 , pp. 306
    • Itani, T.1    Yoshino, H.2    Takizawa, M.3    Yamana, M.4    Tanabe, H.5    Kasana, K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.