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Volumn 4690 II, Issue , 2002, Pages 690-702
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Evaluation of resist-film property for CD control
a a a a |
Author keywords
CD control; Film property; KrF resist; Rmin; Solvent concentration
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Indexed keywords
AMPLIFICATION;
CORRELATION METHODS;
DATA ACQUISITION;
SILICON WAFERS;
SOLVENTS;
CHEMICALLY AMPLIFIED RESISTS (CAR);
PHOTORESISTS;
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EID: 0036029182
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.474269 Document Type: Conference Paper |
Times cited : (4)
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References (4)
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