Polarity effects of polymer on the 193-nm resist performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 781-788

  Choi, Yong Jun ^a   Kim, Jung Woo ^a   Kim, Jong Yong ^a   Yim, Yoon Gil ^a   Kim, Jaehyun ^a   Jung, Jae Chang ^b   Min, Myung Ja ^b   Bok, Chul Kyoo ^b   Shin, Ki Soo ^b  

^a Dongjin Semichem Co Ltd   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

193nm resist; Adhesion; Hydrophilicity; Pattern collapse; Polar groups

Indexed keywords

ADHESION; ALCOHOLS; COMPUTER SIMULATION; ETHERS; HYDROPHILICITY; ORGANIC ACIDS; ORGANIC POLYMERS; PHOTOLITHOGRAPHY; POLYMERIZATION; SUBSTRATES;

INTERMOLECULAR INTERACTIONS; LACTONE; PATTERN COLLAPSE; POLAR GROUPS; POLARITY EFFECTS;

PHOTORESISTS;

EID: 0141834150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485160     Document Type: Conference Paper

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