Analysis of deprotection reaction for chemically amplified resists by using FT-IR spectrometer with exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue II, 2001, Pages 1001-1012

  Miyake, Y ^a   Isono, M ^a   Sekiguchi, A ^a  

^a Jpn   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; POLYMERS; SEMICONDUCTOR DEVICE MANUFACTURE;

CHEMICALLY AMPLIFIED RESISTS;

PHOTORESISTS;

EID: 0034757335     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436825     Document Type: Conference Paper

References (14)