Interferometric-probe aberration monitor performance in the production environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1971-1982

  Robins, Garth C ^a,c   Neureuther, Andrew R ^a,c   Dusa, Mircea ^a,c   Kye, Jongwook ^b,c  

^a ASML US Inc   (United States)

^b AMD ^*

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; Focus monitor; High NA; Illumination; Image; Intensity imbalance; Interference; Phase shifting mask; Printable artifact; Resist image; Zernike aberrations

Indexed keywords

ABERRATION MONITOR; FOCUS MONITOR; HIGH-NA; INTENSITY IMBALANCE; INTERFERENCE; PHASE-SHIFTING MASK; PRINTABLE ARTIFACT; RESIST IMAGE; ZERNIKE ABERRATIONS;

ABERRATIONS; COMPUTER SIMULATION; ELECTRIC FIELDS; ELECTROMAGNETISM; IMAGE ANALYSIS; INTERFEROMETERS; MATHEMATICAL MODELS; PHASE SHIFT; VECTORS;

PHOTORESISTORS;

EID: 3843051214     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536596     Document Type: Conference Paper

References (12)

1. G. McIntyre and A. Neureuther, Proc. SPIE 5040, 162 (2003).
2. F. Gennari, S. Hafeman, and A. Neureuther, Proc SPIE 5377-145, this proceedings.
3. G. Robins and A. Neureuther, JVST B 20 (6), 2610 (Nov. 2002).
4. G. Robins, M. Dusa, B. Geh, and A. Neureuther, Proc. SPIE 5256, 309 (2003).
5. Born and Wolf, Principles of Optics, Chapter 9.
6. G. Robins and A. Neureuther, Proc. SPIE 5040, 1420 (2003).
7. G. Robins, K. Adam, and A. Neureuther, JVST 20 (1), 338 (Jan. 2002).
8. A. Neureuther, K. Adam and S. Hotta, Proc. SPIE 4186, 405 (2001).
9. A. Neureuther, et. al, Proc. SPIE 4346, 331 (2001).
10. K.H. Toh and A.R. Neureuther, Proc. SPIE 772, 202 (1987).
11. P. Dirksen, C. Juffermans, R. Pellens, M. Maenhoudt, and P. De Bisschop, Proc. SPIE 3679, 77 (1999).
12. D. Van Den Broeke, R. Socha, S. Hsu, J. Fung Chen, T. Laidig, N. Corcoran, U. Hollerbach, K. Wampler, and X. Shi, Proc. SPIE 5256, 297 (2004).