Modeling defect-feature interactions in the presence of aberrations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 405-414

  Neureuther, A R ^a   Hotta, S ^a   Adam, K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; Defect and feature interaction; Defect probe; Electric field; Image; Point spread function; Printable artifact; Zernike aberrations

Indexed keywords

CRYSTAL DEFECTS; ELECTRIC FIELD EFFECTS; MATHEMATICAL MODELS; PHASE SHIFT;

DEFECT-FEATURE INTERACTIONS;

MASKS;

EID: 0035043150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410717     Document Type: Conference Paper

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11. Identifying and monitoring effects of lens aberrations in projection printing
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