Characterizing illumination angular uniformity with phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 162-170

  McIntyre, Gregory ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Illumination angular distribution; Local effective source; Optical lithography; Phase shifting test mask; Pupil fill

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; DIFFRACTION GRATINGS; ELECTROMAGNETIC FIELDS; FOURIER TRANSFORMS; MASKS; OPTICAL MICROSCOPY; SILICON WAFERS;

ILLUMINATION ANGULAR DISTRIBUTION; LINEAR PHASE GRATING; LOCAL EFFECTIVE SOURCE; OPTICAL PROJECTION PRINTING; PHASE SHIFTING MASK;

PHOTOLITHOGRAPHY;

EID: 0141833798     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485438     Document Type: Conference Paper

References (7)

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