Operational model for pattern and probe based aberration monitors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2610-2616

  Robins, Garth ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; DIFFRACTION; ELECTROOPTICAL EFFECTS; FOURIER TRANSFORMS; IMAGING SYSTEMS; LIGHT TRANSMISSION; NUMERICAL ANALYSIS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION; POLYNOMIALS; WAVEFRONTS;

ABERRATION MEASUREMENT; ALTERNATING PHASE SQUARE WAVE TRANSMISSION;

PHOTOLITHOGRAPHY;

EID: 0036883132     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1526603     Document Type: Article

References (9)

1. C. Garza, W. Conley, B. Roman, M. Schippers, J. Foster, J. Baselmans, K. Cummings and D. Flagello, Proc. SPIE 4346, 36 (2001).
2. T. A. Brunner, IBM J. Res. Dev. 41, 57 (1997).
3. F. Gennari and A. Neureuther, Proc. SPIE 4562, 1077 (2001).
4. J. Kirk, Proc. SPIE 4000, 2 (2000).
5. P. Dirksen, C. Juffermans, R. Pellens, M. Maenhoudt, and P. De Bisschop, Proc. SPIE 3679, 77 (1999).
6. P. Dirksen, C. Juffermans, A. Engelen, P. De Bisschop, and H. Muellerke, Proc. SPIE 4000, 9 (2000).
7. Litel web site at http://www.litel.net/
8. G. Robins, K. Adam, and A. Neureuther, J. Vac. Sci. Technol. B 20, 338 (2002).
9. Born and Wolf, Principles of Optics (Cambridge University Press, Cambridge, England, 1999).