Experimental assessment of pattern and probe-based aberration monitors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1420-1431

  Robins, Garth C ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Aberration monitor; Defect and feature interaction; Defect probe; Illumination; Image; Intensity imbalance; Interference; Partial coherence; Phase shifting mask; Printable artifact; Zernike aberrations

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; FOCUSING; INTERFEROMETRY; MASKS; PHASE SHIFT; PROBES;

ABERRATION MONITORS; PARTIAL COHERENCE; PHASE SHIFT MASKS; ZERNIKE ABERRATIONS;

LITHOGRAPHY;

EID: 0141498301     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485491     Document Type: Conference Paper

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