-
1
-
-
0001832262
-
-
FEREFH 1025-580X.
-
J. F. Scott, Ferroelectr. Rev. FEREFH 1025-580X 21, 1 (1998).
-
(1998)
Ferroelectr. Rev.
, vol.21
, pp. 1
-
-
Scott, J.F.1
-
3
-
-
35348846979
-
-
SCIEAS 0036-8075 10.1126/science.246.4936.1400.
-
J. F. Scott and C. A. Paz de Araujo, Science SCIEAS 0036-8075 10.1126/science.246.4936.1400 246, 1400 (1989).
-
(1989)
Science
, vol.246
, pp. 1400
-
-
Scott, J.F.1
Paz De Araujo, C.A.2
-
4
-
-
33644783633
-
-
PSSABA 0031-8965 10.1002/pssa.2211410112.
-
S. B. Desu, Phys. Status Solidi A PSSABA 0031-8965 10.1002/pssa. 2211410112 141, 119 (1994).
-
(1994)
Phys. Status Solidi A
, vol.141
, pp. 119
-
-
Desu, S.B.1
-
5
-
-
0003023414
-
-
JAPIAU 0021-8979 10.1063/1.360353.
-
S. S. Sengupta, D. Roberts, J. -F. Li, M. C. Kim, and D. A. Payne, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.360353 78, 1171 (1995).
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 1171
-
-
Sengupta, S.S.1
Roberts, D.2
Li, J.-F.3
Kim, M.C.4
Payne, D.A.5
-
6
-
-
84986409331
-
-
JACTAW 0002-7820 10.1111/j.1151-2916.1993.tb03922.x.
-
Q. Ma and D. R. Clarke, J. Am. Ceram. Soc. JACTAW 0002-7820 10.1111/j.1151-2916.1993.tb03922.x 76, 1433 (1993).
-
(1993)
J. Am. Ceram. Soc.
, vol.76
, pp. 1433
-
-
Ma, Q.1
Clarke, D.R.2
-
7
-
-
0001162409
-
-
JAPIAU 0021-8979 10.1063/1.360229.
-
E. Ching-Prado, A. Reynes-Figueroa, R. S. Katiyar, S. B. Majimder, and D. C. Agrawal, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.360229 78, 1920 (1995).
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 1920
-
-
Ching-Prado, E.1
Reynes-Figueroa, A.2
Katiyar, R.S.3
Majimder, S.B.4
Agrawal, D.C.5
-
9
-
-
0000556452
-
-
JMTSAS 0022-2461 10.1007/BF00543940.
-
J. H. L. Voncken, C. Lijzenga, K. P. Kumcer, K. Kiezer, A. J. Burggraaf, and B. C. Benekamp, J. Mater. Sci. JMTSAS 0022-2461 10.1007/BF00543940 27, 472 (1992).
-
(1992)
J. Mater. Sci.
, vol.27
, pp. 472
-
-
Voncken, J.H.L.1
Lijzenga, C.2
Kumcer, K.P.3
Kiezer, K.4
Burggraaf, A.J.5
Benekamp, B.C.6
-
10
-
-
0001421306
-
-
JAPIAU 0021-8979 10.1063/1.366971.
-
S. S. Sengupta, S. M. Park, D. A. Payne, and L. H. Allen, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.366971 83, 2291 (1998).
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 2291
-
-
Sengupta, S.S.1
Park, S.M.2
Payne, D.A.3
Allen, L.H.4
-
11
-
-
1642619038
-
-
JPAPBE 0022-3727 10.1088/0022-3727/37/5/015.
-
D. Valim, A. G. Sauza Filho, P. T. C. Freire, J. Mendes Filho, C. A. Guavany, R. N. Reispaud, and E. B. Araujo, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/37/5/015 37, 744 (2004).
-
(2004)
J. Phys. D
, vol.37
, pp. 744
-
-
Valim, D.1
Sauza Filho, A.G.2
Freire, P.T.C.3
Mendes Filho, J.4
Guavany, C.A.5
Reispaud, R.N.6
Araujo, E.B.7
-
12
-
-
0000555967
-
-
APPLAB 0003-6951 10.1063/1.1308061.
-
D. Fu, T. Ogawa, H. Suzuki, and K. Ishikawa, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1308061 77, 1532 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 1532
-
-
Fu, D.1
Ogawa, T.2
Suzuki, H.3
Ishikawa, K.4
-
13
-
-
0033556890
-
-
JAPIAU 0021-8979 10.1063/1.369516.
-
A. -D. Li, D. Wu, C. -Z. Ge, P. Lu, W. -H. Ma, M. -S. Zhang, C. -Y. Xu, J. Zuo, and N. -B. Ming, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.369516 85, 2146 (1999).
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 2146
-
-
Li, A.-D.1
Wu, D.2
Ge, C.-Z.3
Lu, P.4
Ma, W.-H.5
Zhang, M.-S.6
Xu, C.-Y.7
Zuo, J.8
Ming, N.-B.9
-
14
-
-
0032606527
-
-
JAPIAU 0021-8979 10.1063/1.370810.
-
P. S. Dobal, S. Bhaskar, S. B. Majamder, and R. S. Katiyar, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.370810 86, 828 (1999).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 828
-
-
Dobal, P.S.1
Bhaskar, S.2
Majamder, S.B.3
Katiyar, R.S.4
-
15
-
-
0000521804
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.55.12218.
-
L. Sun, Y. F. Chen, L. He, C. -Z. Ge, D. -S. Ding, T. Yu, M. -S. Zhang, and N. B. Ming, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.55.12218 55, 12218 (1997).
-
(1997)
Phys. Rev. B
, vol.55
, pp. 12218
-
-
Sun, L.1
Chen, Y.F.2
He, L.3
Ge, C.-Z.4
Ding, D.-S.5
Yu, T.6
Zhang, M.-S.7
Ming, N.B.8
-
16
-
-
79956047835
-
-
APPLAB 0003-6951 10.1063/1.1473864.
-
S. -H. Lee, H. M. Jang, S. M. Cho, and G. -C. Yi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1473864 80, 3165 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 3165
-
-
Lee, S.-H.1
Jang, H.M.2
Cho, S.M.3
Yi, G.-C.4
-
17
-
-
33947304936
-
-
APPLAB 0003-6951 10.1063/1.2713131.
-
H. Zheng, J. Kreisel, Y. H. Chu, R. Ramesh, and L. Salamanca-Riba, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2713131 90, 113113 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 113113
-
-
Zheng, H.1
Kreisel, J.2
Chu, Y.H.3
Ramesh, R.4
Salamanca-Riba, L.5
-
20
-
-
28844473285
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.95.196804.
-
I. A. Kornev, L. Bellaiche, P. Bouvier, P. E. Janolin, B. Dkhil, and J. Kreisel, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.95.196804 95, 196804 (2005).
-
(2005)
Phys. Rev. Lett.
, vol.95
, pp. 196804
-
-
Kornev, I.A.1
Bellaiche, L.2
Bouvier, P.3
Janolin, P.E.4
Dkhil, B.5
Kreisel, J.6
-
21
-
-
34249035459
-
-
PHTRDP 0141-1594 10.1080/01411590701228117.
-
I. A. Kornev and L. Bellaiche, Phase Transitions PHTRDP 0141-1594 10.1080/01411590701228117 80, 385 (2007).
-
(2007)
Phase Transitions
, vol.80
, pp. 385
-
-
Kornev, I.A.1
Bellaiche, L.2
-
22
-
-
0029219344
-
-
SSIOD3 0167-2738 10.1016/0167-2738(94)00151-H.
-
S. Stemmer, S. K. Streiffer, F. Ernst, M. Ruhle, W. -Y. Hsu, and R. Raj, Solid State Ionics SSIOD3 0167-2738 10.1016/0167-2738(94)00151-H 75, 43 (1995).
-
(1995)
Solid State Ionics
, vol.75
, pp. 43
-
-
Stemmer, S.1
Streiffer, S.K.2
Ernst, F.3
Ruhle, M.4
Hsu, W.-Y.5
Raj, R.6
-
23
-
-
36449001166
-
-
JAPIAU 0021-8979 10.1063/1.357097.
-
J. S. Speck and W. Pompe, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.357097 76, 466 (1994).
-
(1994)
J. Appl. Phys.
, vol.76
, pp. 466
-
-
Speck, J.S.1
Pompe, W.2
-
25
-
-
38149066128
-
-
Patent No. FR9308838 WO 95/02711 (Europe, USA, 1993).
-
J. P. Śnateur, F. Weiss, O. Thomas, R. Madar, and A. Abrutis, Patent No. FR9308838 WO 95/02711 (Europe, USA, 1993).
-
-
-
Śnateur, J.P.1
Weiss, F.2
Thomas, O.3
Madar, R.4
Abrutis, A.5
-
26
-
-
38149075328
-
-
in Advances in Inorganic Films and Coatings, edited by P. Vincenzin (Techna srl., Italy).
-
J. P. Senateur, A. Abrutis, F. Felten, F. Weiss, O. Thomas, and R. Madar, in Advances in Inorganic Films and Coatings, edited by, P. Vincenzin, (Techna srl., Italy, 2005).
-
(2005)
-
-
Senateur, J.P.1
Abrutis, A.2
Felten, F.3
Weiss, F.4
Thomas, O.5
Madar, R.6
-
27
-
-
38149006372
-
-
in Innovative Processing of Films and Nanocrystalline Powders, edited by K. -L. Choy (Imperial College Press, London).
-
J. P. Senateur, C. Dubourdieu, V. Galindo, F. Weiss, and A. Abrutis, in Innovative Processing of Films and Nanocrystalline Powders, edited by, K. -L. Choy, (Imperial College Press, London, 2002).
-
(2002)
-
-
Senateur, J.P.1
Dubourdieu, C.2
Galindo, V.3
Weiss, F.4
Abrutis, A.5
-
28
-
-
33644937901
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.72.054110.
-
S. A. Hayward, F. D. Morrison, S. A. T. Redfern, E. K. H. Salje, J. F. Scott, K. S. Knight, S. Tarantino, A. M. Glazer, V. Shuvaeva, P. Daniel, M. Zhang, and M. A. Carpenter, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72. 054110 72, 054110 (2005).
-
(2005)
Phys. Rev. B
, vol.72
, pp. 054110
-
-
Hayward, S.A.1
Morrison, F.D.2
Redfern, S.A.T.3
Salje, E.K.H.4
Scott, J.F.5
Knight, K.S.6
Tarantino, S.7
Glazer, A.M.8
Shuvaeva, V.9
Daniel, P.10
Zhang, M.11
Carpenter, M.A.12
-
29
-
-
0002056762
-
-
AXRAAA 0376-0308.
-
T. Huang, W. Parish, N. Masciocchi, and P. Wang, Adv. X-Ray Anal. AXRAAA 0376-0308 33, 295 (1990).
-
(1990)
Adv. X-Ray Anal.
, vol.33
, pp. 295
-
-
Huang, T.1
Parish, W.2
Masciocchi, N.3
Wang, P.4
-
30
-
-
38149005667
-
-
U. S. National. Bureau of. Standards, Circ. 359.
-
U. S. National. Bureau of. Standards, Circ. 359, 5, 39 (1955).
-
(1955)
, vol.5
, pp. 39
-
-
-
31
-
-
38149003855
-
-
0015-0193
-
A. Bartasyte, A. Abrutis, C. Jimenez, F. Weiss, O. Chaix-Pluchery, and Z. Saltyte, Ferroelectrics 353, 104 (2007). 0015-0193
-
(2007)
Ferroelectrics
, vol.353
, pp. 104
-
-
Bartasyte, A.1
Abrutis, A.2
Jimenez, C.3
Weiss, F.4
Chaix-Pluchery, O.5
Saltyte, Z.6
-
32
-
-
0031250058
-
-
0884-2914
-
A. G. Kalinichev, J. D. Bass, B. N. Sun, and D. A. Payne, J. Mater. Res. 12, 2623 (1997). 0884-2914
-
(1997)
J. Mater. Res.
, vol.12
, pp. 2623
-
-
Kalinichev, A.G.1
Bass, J.D.2
Sun, B.N.3
Payne, D.A.4
-
33
-
-
34547374271
-
-
AMETAR 0001-6160 10.1016/0001-6160(53)90006-6.
-
G. K. Williamson and W. H. Hall, Acta Metall. AMETAR 0001-6160 10.1016/0001-6160(53)90006-6 1, 22 (1953).
-
(1953)
Acta Metall.
, vol.1
, pp. 22
-
-
Williamson, G.K.1
Hall, W.H.2
-
34
-
-
0000917707
-
-
ACCRA9 0365-110X 10.1107/S0365110X66000628.
-
N. C. Halder and C. N. J. Wagner, Acta Crystallogr. ACCRA9 0365-110X 10.1107/S0365110X66000628 20, 312 (1966).
-
(1966)
Acta Crystallogr.
, vol.20
, pp. 312
-
-
Halder, N.C.1
Wagner, C.N.J.2
-
35
-
-
38149142794
-
-
Mat. Sci. Forum, Proceedings of 7th European. Powder Diffraction Conference (EPDIC 7) (), edited by R. Delhez and E. J. Mittenmeijer.
-
T. Roisnel and J. Rodriguez-Carvajal, Mat. Sci. Forum, Proceedings of 7th European. Powder Diffraction Conference (EPDIC 7) (2000) 118, edited by, R. Delhez, and, E. J. Mittenmeijer,.
-
(2000)
, vol.118
-
-
Roisnel, T.1
Rodriguez-Carvajal, J.2
-
36
-
-
0029389215
-
-
THSFAP 0040-6090 10.1016/0040-6090(95)06675-6.
-
M. de Keijser, D. M. de Leeuw, P. J. van Veldhoven, A. E. M. De Veirman, D. G. Neerinck, and G. J. M. Dormans, Thin Solid Films THSFAP 0040-6090 10.1016/0040-6090(95)06675-6 266, 157 (1995).
-
(1995)
Thin Solid Films
, vol.266
, pp. 157
-
-
De Keijser, M.1
De Leeuw, D.M.2
Van Veldhoven, P.J.3
De Veirman, A.E.M.4
Neerinck, D.G.5
Dormans, G.J.M.6
-
37
-
-
0043276457
-
-
JCOMEL 0953-8984 10.1088/0953-8984/3/44/014.
-
M. D. Fontana, H. Idrissi, G. E. Kugel, and J. Wojcik, J. Phys.: Condens. Matter JCOMEL 0953-8984 10.1088/0953-8984/3/44/014 3, 8695 (1991).
-
(1991)
J. Phys.: Condens. Matter
, vol.3
, pp. 8695
-
-
Fontana, M.D.1
Idrissi, H.2
Kugel, G.E.3
Wojcik, J.4
-
38
-
-
0942301930
-
-
JECSER 0955-2219 10.1016/S0955-2219(03)00454-0.
-
T. Ohno, D. Fu, H. Suzuki, H. Migazaki, and K. Ishikawa, J. Eur. Ceram. Soc. JECSER 0955-2219 10.1016/S0955-2219(03)00454-0 24, 1669 (2004).
-
(2004)
J. Eur. Ceram. Soc.
, vol.24
, pp. 1669
-
-
Ohno, T.1
Fu, D.2
Suzuki, H.3
Migazaki, H.4
Ishikawa, K.5
-
39
-
-
0032050085
-
-
PSSABA 0031-8965 10.1002/(SICI)1521-396X(199804)166:2<811::AID- PSSA811>3.0.CO;2-X.
-
W. Ma, M. Zhang, and Z. Lu, Phys. Status Solidi A PSSABA 0031-8965 10.1002/(SICI)1521-396X(199804)166:2<811::AID-PSSA811>3.0.CO;2-X 166, 811 (1998).
-
(1998)
Phys. Status Solidi A
, vol.166
, pp. 811
-
-
Ma, W.1
Zhang, M.2
Lu, Z.3
-
40
-
-
38149016370
-
-
(accepted). 0031-8965
-
A. Bartasyte, O. Chaix-Pluchery, J. Kreisel, J. Santiso, S. Margueron, M. Boudard, C. Jimenez, A. Abrutis, and F. Weiss, IEEE Trans. Ultrason. Ferroelectr. Freq. Control (accepted). 0031-8965
-
IEEE Trans. Ultrason. Ferroelectr. Freq. Control
-
-
Bartasyte, A.1
Chaix-Pluchery, O.2
Kreisel, J.3
Santiso, J.4
Margueron, S.5
Boudard, M.6
Jimenez, C.7
Abrutis, A.8
Weiss, F.9
-
41
-
-
0032010875
-
-
APAMFC 0947-8396 10.1007/s003390050676.
-
W. Ma, M. Zhang, T. Yu, Y. Chen, and N. Ming, Appl. Phys. A APAMFC 0947-8396 10.1007/s003390050676 66, 345 (1998).
-
(1998)
Appl. Phys. A
, vol.66
, pp. 345
-
-
Ma, W.1
Zhang, M.2
Yu, T.3
Chen, Y.4
Ming, N.5
-
42
-
-
0000138175
-
-
JAPIAU 0021-8979 10.1063/1.353862.
-
I. Taguchi, A. Pignolet, L. Wang, M. Proctor, F. Levy, and P. E. Schmid, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.353862 73, 394 (1993).
-
(1993)
J. Appl. Phys.
, vol.73
, pp. 394
-
-
Taguchi, I.1
Pignolet, A.2
Wang, L.3
Proctor, M.4
Levy, F.5
Schmid, P.E.6
-
43
-
-
0036470284
-
-
JAPIAU 0021-8979 10.1063/1.1421219.
-
C. S. Ganpule, V. Nagarajan, B. K. Hill, A. L. Roytbard, E. D. Willians, S. P. Alpay, A. Roelops, R. Waser, and L. M. Eng, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1421219 91, 1477 (2002).
-
(2002)
J. Appl. Phys.
, vol.91
, pp. 1477
-
-
Ganpule, C.S.1
Nagarajan, V.2
Hill, B.K.3
Roytbard, A.L.4
Willians, E.D.5
Alpay, S.P.6
Roelops, A.7
Waser, R.8
Eng, L.M.9
-
44
-
-
33845434307
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.48.10160.
-
C. M. Foster, Z. Li, M. Grimsditch, S. -K. Chan, and D. J. Lam, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.48.10160 48, 10160 (1993).
-
(1993)
Phys. Rev. B
, vol.48
, pp. 10160
-
-
Foster, C.M.1
Li, Z.2
Grimsditch, M.3
Chan, S.-K.4
Lam, D.J.5
-
45
-
-
28444461415
-
-
APPLAB 0003-6951 10.1063/1.2139844.
-
M. Osada, K. Nishida, S. Wada, and T. Katoda, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2139844 87, 232902 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 232902
-
-
Osada, M.1
Nishida, K.2
Wada, S.3
Katoda, T.4
|