Relationship between domain structure and film thickness in epitaxial PbTiO3 films deposited on MgO(OOl) by reactive sputtering

Journal of Materials Research

Volumn 14, Issue 12, 1999, Pages 4677-4684

  Choi, Won Kyoung ^a   Choi, Si Kyoung ^a   Lee, Hyuck Mo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; MAGNESIA; MAGNETRON SPUTTERING; PHASE COMPOSITION; SPUTTER DEPOSITION; TENSILE STRESS; THERMAL STRESS; VOLUME FRACTION;

LEAD TITANATE; REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING; TENSILE EPITAXIAL STRESS;

DIELECTRIC FILMS;

EID: 0033353868     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0633     Document Type: Article

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