Residual stress in lead titanate thin film on different substrates

Journal of the European Ceramic Society

Volumn 24, Issue 6, 2004, Pages 1669-1672

  Ohno, Tomoya ^a   Fu, Desheng ^a   Suzuki, Hisao ^a   Miyazaki, Hidetoshi ^b   Ishikawa, Kenji ^c  

^a SHIZUOKA UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c YOKKAICHI UNIVERSITY   (Japan)

Author keywords

Capacitors; Dielectric properties; Perovskites; Residual stress; Sol gel process

Indexed keywords

PERMITTIVITY; PHONONS; RESIDUAL STRESSES; THERMAL EXPANSION; THIN FILMS;

LATTICE MODE FREQUENCIES;

LEAD COMPOUNDS;

RESIDUAL STRESS;

EID: 0942301930     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(03)00454-0     Document Type: Article

References (15)

1. Yamakawa K. Imai K. Arisumi O. Arikado T. Yoshikawa M. Owada T. Okumura K. Novel PZT crystallization technique using flash lamp for ferroelectric RAM (FeRAM) embedded LSIs and one transistor type FeRAM devices Jpn. J. Appl. Phys. 42 2002 2630
2. Noritake K. Matsukawa T. Koh M. Hara K. Goto M. Ohdomari I. Site dependence of soft errors induced by single-ion hitting in 64 kbit static random access memory (SRAM) Jpn. J. Appl. Phys. 31 1992 L771
3. Whatmore R.W. Osbond P.C. Shorrocks N.M. Ferroelectric materials for thermal IR detectors Ferroelectrics 76 1987 351
4. 3 films Appl. Phys. Lett. 72 1998 3374
5. 3 thin films by sol-gel casting Jpn. J. Appl. Phys. 39 2000 5429
6. 3 single crystals Appl. Phys. Lett. 77 2000 1535
7. Fu D.S. Ogawa T. Suzuki H. Ishikawa K. Thickness dependence of stress in lead titanate thin films deposited on Pt-coated Si Appl. Phys. Lett. 77 2000 1532
8. 3 thin film capacitors Jpn. J. Appl. Phys. 38 1999 5305
9. 3 ferroelectric thin films Phys. Rev. B55 1997 12218
10. 3 thin film from molecular-designed alkoxide precursor solution Jpn. J. Appl. Phys. 35 1996 4896
11. 3 Phys. Rev. B7 1973 3088
12. 3 Phys. Rev. B28 1983 7260
13. 3 and on the ferroelectric-paraelectric phase transition Phys. Rev. B11 1975 1188
14. 3 thin films deposited on Pt/Si substrates J. Phys,: Condens. Matter 12 2000 399
15. 3 Phys. Rev. B7 1973 3088