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Volumn 92, Issue 1, 2008, Pages

Change in band alignment of Hf O2 films with annealing treatments

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY GAP; HAFNIUM COMPOUNDS; NITRIDES; REFLECTION; VALENCE BANDS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT GASES; BAND OFFSETS; ION SCATTERING; NITROGEN PLASMA TREATMENT; POSTANNEALING CONDITIONS;

THIN FILMS;

EID: 38049045491 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2826270 Document Type: Article

Times cited : (28)

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