Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation

Applied Physics Letters

Volumn 74, Issue 6, 1999, Pages 806-808

  Baumvol, I J R ^a   Krug, C ^a   Stedile, F C ^a   Green, M L ^b   Jacobson, D C ^b   Eaglesham, D ^b   Bernstein, J D ^c   Shao, J ^c   Denholm, A S ^c   Kellerman, P L ^c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b LUCENT TECHNOLOGIES   (United States)

^c EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000565940     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123374     Document Type: Article

References (17)

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