메뉴 건너뛰기




Volumn 55, Issue 1, 2008, Pages 430-434

Evaluation of RF-stress effect on class-E MOS power-amplifier efficiency

Author keywords

Breakdown (BD); Class E power amplifier (PA); MOS devices; Power efficiency; RF stress

Indexed keywords

ELECTRIC POTENTIAL; ENERGY EFFICIENCY; LEAKAGE CURRENTS; POWER AMPLIFIERS;

EID: 37749016604     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2007.911092     Document Type: Article
Times cited : (22)

References (19)
  • 1
    • 0020783304 scopus 로고
    • Hot-electron currents in very short channel MOSFETs
    • Jul
    • S. Tam, F.-C. Hsu, C. Hu, R. S. Muller, and P. K. Ko, "Hot-electron currents in very short channel MOSFETs," IEEE Electron Device Lett. vol. EDL-4, no. 7, pp. 249-251, Jul. 1983.
    • (1983) IEEE Electron Device Lett , vol.EDL-4 , Issue.7 , pp. 249-251
    • Tam, S.1    Hsu, F.-C.2    Hu, C.3    Muller, R.S.4    Ko, P.K.5
  • 2
    • 0030242886 scopus 로고    scopus 로고
    • Soft breakdown of ultra-thin gate oxide layers
    • Sep
    • M. Depas, T. Nigam, and M. M. Heyns, "Soft breakdown of ultra-thin gate oxide layers," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1499-1504, Sep. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , Issue.9 , pp. 1499-1504
    • Depas, M.1    Nigam, T.2    Heyns, M.M.3
  • 3
    • 0033750709 scopus 로고    scopus 로고
    • Investigation of ultra-thin gate oxide reliability behavior by separate characterization of soft breakdown and hard breakdown
    • T. Pompl, H. Wurzer, M. Kerber, and I. Eisele, "Investigation of ultra-thin gate oxide reliability behavior by separate characterization of soft breakdown and hard breakdown," in Proc. Int. Phys. Symp., Tech. Dig., 2000, pp. 40-47.
    • (2000) Proc. Int. Phys. Symp., Tech. Dig , pp. 40-47
    • Pompl, T.1    Wurzer, H.2    Kerber, M.3    Eisele, I.4
  • 4
    • 3042557108 scopus 로고    scopus 로고
    • Effect of gate-oxide breakdown on RF performance
    • Sep
    • H. Yang, J. S. Yuan, Y. Liu, and E. Xiao, "Effect of gate-oxide breakdown on RF performance," IEEE Trans. Device Mater. Rel., vol. 3, no. 3, pp. 93-97, Sep. 2003.
    • (2003) IEEE Trans. Device Mater. Rel , vol.3 , Issue.3 , pp. 93-97
    • Yang, H.1    Yuan, J.S.2    Liu, Y.3    Xiao, E.4
  • 5
    • 29344468684 scopus 로고    scopus 로고
    • Effects of hot-carrier stress on the performance of CMOS low-noise amplifiers
    • Sep
    • S. Naseh, M. J. Deen, and C.-H. Chen, "Effects of hot-carrier stress on the performance of CMOS low-noise amplifiers," IEEE Trans. Device Mater. Rel., vol. 5, no. 3, pp. 501-508, Sep. 2005.
    • (2005) IEEE Trans. Device Mater. Rel , vol.5 , Issue.3 , pp. 501-508
    • Naseh, S.1    Deen, M.J.2    Chen, C.-H.3
  • 6
    • 0036851281 scopus 로고    scopus 로고
    • Hot-carrier and soft-breakdown effects on VCO performance
    • Nov
    • E. Xiao, J. S. Yuan, and H. Yang, "Hot-carrier and soft-breakdown effects on VCO performance," IEEE Trans. Microw. Theory Tech., vol. 5, no. 3, pp. 2453-2458, Nov. 2002.
    • (2002) IEEE Trans. Microw. Theory Tech , vol.5 , Issue.3 , pp. 2453-2458
    • Xiao, E.1    Yuan, J.S.2    Yang, H.3
  • 7
    • 23944522129 scopus 로고    scopus 로고
    • Reliability evaluation of class-E and class-A power amplifiers with nanoscaled CMOS technology
    • Jul
    • W.-C. Lin, T.-C. Wu, Y.-H. Tasi, L.-J. Du, and Y.-C. King, "Reliability evaluation of class-E and class-A power amplifiers with nanoscaled CMOS technology," IEEE Trans. Electron Devices, vol. 52, no. 7, pp. 1478-1483, Jul. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.7 , pp. 1478-1483
    • Lin, W.-C.1    Wu, T.-C.2    Tasi, Y.-H.3    Du, L.-J.4    King, Y.-C.5
  • 8
    • 21644473397 scopus 로고    scopus 로고
    • RF power potential of 90 nm CMOS: Device options, performance, and reliability
    • J. Scholvin, D. R. Greenberg, and J. A. del Alamo, "RF power potential of 90 nm CMOS: Device options, performance, and reliability," in IEDM Tech. Dig., 2004, pp. 455-458.
    • (2004) IEDM Tech. Dig , pp. 455-458
    • Scholvin, J.1    Greenberg, D.R.2    del Alamo, J.A.3
  • 9
    • 23344449696 scopus 로고    scopus 로고
    • MOS RF reliability subject to dynamic voltage stress - Modeling and analysis
    • Aug
    • C. Yu and J. S. Yuan, "MOS RF reliability subject to dynamic voltage stress - Modeling and analysis," IEEE Trans. Electron Devices, vol. 52, no. 8, pp. 751-758, Aug. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.8 , pp. 751-758
    • Yu, C.1    Yuan, J.S.2
  • 12
    • 0038732515 scopus 로고    scopus 로고
    • A model for gate-oxide breakdown in CMOS inverters
    • Feb
    • R. Rodriguez, J. H. Stathis, and B. P. Linder, "A model for gate-oxide breakdown in CMOS inverters," IEEE Electron Device Lett., vol. 24, no. 2, pp. 114-116, Feb. 2003.
    • (2003) IEEE Electron Device Lett , vol.24 , Issue.2 , pp. 114-116
    • Rodriguez, R.1    Stathis, J.H.2    Linder, B.P.3
  • 14
    • 59949096250 scopus 로고    scopus 로고
    • Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications
    • R. Degraeve, B. Kaczer, A. D. Keersgieter, and G. Groeseneken, "Relation between breakdown mode and breakdown location in short channel nMOSFETs and its impact on reliability specifications," in Proc. Int. Rel. Phys, Symp., Tech. Dig., 2001, pp. 360-366.
    • (2001) Proc. Int. Rel. Phys, Symp., Tech. Dig , pp. 360-366
    • Degraeve, R.1    Kaczer, B.2    Keersgieter, A.D.3    Groeseneken, G.4
  • 15
    • 0035691727 scopus 로고    scopus 로고
    • The impact of postbreakdown gate leakage on MOSFET RF performances
    • Dec
    • L. Pantisano and K. P. Cheung, "The impact of postbreakdown gate leakage on MOSFET RF performances," IEEE Electron Device Lett., vol. 22, no. 12, pp. 585-587, Dec. 2001.
    • (2001) IEEE Electron Device Lett , vol.22 , Issue.12 , pp. 585-587
    • Pantisano, L.1    Cheung, K.P.2
  • 16
    • 33846055313 scopus 로고    scopus 로고
    • 2 gate breakdown and transient charge-trapping effect
    • Jan
    • 2 gate breakdown and transient charge-trapping effect," IEEE Trans. Electron Devices, vol. 54, no. 1, pp. 59-67, Jan. 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.1 , pp. 59-67
    • Yu, C.1    Yuan, J.S.2
  • 18
    • 0016521160 scopus 로고
    • Class E - A new class of high-efficiency tuned single-ended switching power amplifiers
    • Jun
    • N. O. Sokal and A. D. Sokal, "Class E - A new class of high-efficiency tuned single-ended switching power amplifiers," IEEE J. Solid-State Circuits, vol. SSC-10, no. 3, pp. 168-176, Jun. 1975.
    • (1975) IEEE J. Solid-State Circuits , vol.SSC-10 , Issue.3 , pp. 168-176
    • Sokal, N.O.1    Sokal, A.D.2
  • 19
    • 4744376270 scopus 로고    scopus 로고
    • Power losses and efficiency of class-E power amplifier at any duty ratio
    • Sep
    • D. J. Kessler and M. K. Kazimierczuk, "Power losses and efficiency of class-E power amplifier at any duty ratio," IEEE Trans. Circuits Syst., vol. 51, no. 9, pp. 1675-1689, Sep. 2004.
    • (2004) IEEE Trans. Circuits Syst , vol.51 , Issue.9 , pp. 1675-1689
    • Kessler, D.J.1    Kazimierczuk, M.K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.