Thermal stability of Pd supported on single crystalline SiO 2 thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2319-2323

  Min, B K ^a   Santra, A K ^a   Goodman, D W ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURE; INTERDIFFUSION;

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CATALYSTS; DEPOSITION; DESORPTION; EPITAXIAL GROWTH; POINT DEFECTS; PYROMETERS; SCANNING TUNNELING MICROSCOPY; SILICA; SINGLE CRYSTALS; SINTERING; THERMODYNAMIC STABILITY; THIN FILMS;

PALLADIUM;

EID: 0942278348     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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