Oxime sulfonate chemistry for advanced microlithography

Journal of Photopolymer Science and Technology

Volumn 20, Issue 5, 2007, Pages 637-642

  Yamato, Hitoshi ^a   Asakura, Toshikage ^a   Nishimae, Yuichi ^a   Matsumoto, Akira ^a   Tanabe, Junichi ^a   Birbaum, Jean Luc ^a   Murer, Peter ^a   Hintermann, Tobias ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

ArF; Chemically amplified resist; g line; i line; KrF; Oxime sulfonate; Photoacid generator

Indexed keywords

EID: 37549054623     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.637     Document Type: Article

References (14)

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