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Volumn 6153 I, Issue , 2006, Pages

Non-ionic photoacid generators for chemically amplified photoresists: Structure effect on resist performance

Author keywords

ArF; Chemically amplified resist; Non ionic; Photoacid generator; Strong acid

Indexed keywords

COATINGS; CONTAMINATION; HYDROPHOBICITY; IRRADIATION; LITHOGRAPHY; STRUCTURE (COMPOSITION);

EID: 33745631820     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655079     Document Type: Conference Paper
Times cited : (6)

References (16)
  • 1
    • 0036380442 scopus 로고    scopus 로고
    • B. J. Lin, Proc. SPIE 4688, pp. 11-24, 2002.
    • (2002) Proc. SPIE , vol.4688 , pp. 11-24
    • Lin, B.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.