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Volumn 90, Issue 3, 2008, Pages 457-463
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Finite-element analysis of the mechanical behavior of Au/Cu and Cu/Au multilayers on silicon substrate under nanoindentation
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Author keywords
[No Author keywords available]
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Indexed keywords
DEFORMATION;
FILM THICKNESS;
FINITE ELEMENT METHOD;
NANOINDENTATION;
SEMICONDUCTING SILICON;
BILAYER THICKNESSES;
EQUIVALENT STRESS;
THINNER MULTILAYERS;
MULTILAYERS;
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EID: 37549022584
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-007-4303-3 Document Type: Article |
Times cited : (16)
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References (19)
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