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Volumn 29, Issue 1, 2008, Pages 18-20

0.25 μm self-aligned AlGaN/GaN high electron mobility transistors

Author keywords

GaN; High electron mobility transistors (HEMTs); Self aligned; SiC

Indexed keywords

CONTACT RESISTANCE; CURRENT DENSITY; DRAIN CURRENT; OHMIC CONTACTS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; TRANSCONDUCTANCE;

EID: 37549001298     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.911612     Document Type: Article
Times cited : (28)

References (13)
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    • Field-plated 0.25 μm gatelength AlGaN/GaN HEMTs with varying field-plate length
    • Jun
    • V. Kumar, G. Chen, S. Guo, and I. Adesida, "Field-plated 0.25 μm gatelength AlGaN/GaN HEMTs with varying field-plate length," IEEE Trans. Electron Devices, vol. 53, no. 6, pp. 1477-1480, Jun. 2006.
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    • M. Higashiwaki, T. Mmiura, and T. Matsui, "30-nm-gate AlGaN/GaN heterostructure field-effect transistors with a current-gain cutoff frequency of 181 GHz," Jpn. J. Appl. Phys., vol. 45, no. 42, pp. L1 111-L1 113, 2006.
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    • C. H. Chen, S. Keller, G. Parish, R. Vetury, P. Kozodoy, E. L. Hu, S. P. Denbaars, and U. K. Mishra, "High-transconductance self-aligned AlGaN/GaN modulation-doped field-effect transistors with regrown ohmic contacts," Appl. Phys. Lett., vol. 73, no. 21, pp. 3147-3149, Nov. 1998.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.