Production of high-quality ZnO films by the two-step annealing method

Journal of Applied Physics

Volumn 96, Issue 9, 2004, Pages 5308-5310

  Ye, J D ^a   Gu, S L ^a   Zhu, S M ^a   Qin, F ^a   Liu, S M ^a   Liu, W ^a   Zhou, X ^a   Hu, L Q ^a   Zhang, R ^a   Shi, Y ^a   Zheng, Y D ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; COMPRESSIVE STRESS; DESORPTION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; OHMIC CONTACTS; OPTICAL PROPERTIES; OPTIMIZATION; OXYGEN; QUALITY CONTROL; ZINC;

BAND GAP; CRYSTALLINE PHASES; OPTOELECTRIC APPLICATIONS; ULTRAVIOLET REGIONS;

ANNEALING;

EID: 9744239507     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1791755     Document Type: Article

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