Structural, chemical and optical characterizations of nanocrystallized AlN:Er thin films prepared by r.f. magnetron sputtering

Materials Science and Engineering: B

Volumn 146, Issue 1-3, 2008, Pages 200-203

  Brien, V ^a   Miska, P ^b   Rinnert, H ^b   Geneve D ^a   Pigeat, P ^a  

^a CNRS   (France)

^b INSTITUT JEAN LAMOUR   (France)

Author keywords

Aluminium nitride; Doping effects; Luminescence; Magnetron sputtering; Optical properties; Thin films

Indexed keywords

CRYSTAL STRUCTURE; LUMINESCENCE; MAGNETRON SPUTTERING; NANOCRYSTALLIZATION; PARAMETER ESTIMATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CLIFF LORIMER SENSITIVITY; DOPING EFFECTS; ER CONCENTRATION RATE; SILICON SUBSTRATES;

ALUMINUM COMPOUNDS;

EID: 37449002476     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.07.018     Document Type: Article

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