Effect of high temperature annealing on the electrical performance of titanium/platinum thin films

Thin Solid Films

Volumn 516, Issue 6, 2008, Pages 898-906

  Schmid, U ^a   Seidel, H ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

Electrical properties and measurements; Physical vapour deposition (PVD); Platinum; Titanium

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM THICKNESS; PHYSICAL VAPOR DEPOSITION; PLASTIC DEFORMATION; PLATINUM; THERMAL LOAD; TITANIUM;

FILM RESISTIVITY; FILM STRESS; POST DEPOSITION ANNEALING;

THIN FILMS;

EID: 37349048313     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.04.128     Document Type: Article

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