A study of the spatial variation of electric field in highly resistivemetal films by scanning tunneling potentiometry

Applied Physics A: Materials Science and Processing

Volumn 66, Issue SUPPL. 1, 1998, Pages

  Ramaswamy, G ^a   Raychaudhuri, A K ^a   Das Gupta, K ^a   Sambandamurthy, G ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE GRAIN SIZE; BULK RESISTIVITY; ELECTRON BEAM EVAPORATION; ELECTRONIC TRANSPORT; IN-FIELD; POTENTIOMETRY; REFLECTION COEFFICIENTS; SPATIAL VARIATIONS; TEMPERATURE RANGE; THIN PLATINUM FILMS;

ELECTRIC FIELDS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; PLATINUM; POTENTIOMETERS (ELECTRIC MEASURING INSTRUMENTS); RESISTIVE EVAPORATION; SCANNING; SCANNING TUNNELING MICROSCOPY;

WIND TUNNELS;

EID: 33750936108     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s003390051178     Document Type: Article

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