SCOPUS 정보 검색 플랫폼

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 227-231

CrN films deposited by rf reactive sputtering using a plasma emission monitoring control

(3) Inoue, Shozo a Okada, Futami a Koterazawa, Keiji a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

Composition; CrN; Hardness; Nitrogen partial pressure; Resistivity; Rf Reactive sputtering; Structure

Indexed keywords

CHROMIUM COMPOUNDS; CONTROL SYSTEMS; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; GLASS; HARDNESS; LIGHT EMISSION; MAGNETRON SPUTTERING; STOICHIOMETRY; STRESS ANALYSIS; SUBSTRATES;

RADIO FREQUENCY REACTIVE SPUTTERING;

INORGANIC COATINGS;

EID: 0037136209 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(02)00146-X Document Type: Article

Times cited : (21)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.