Narrow linewidth templates for nanoimprint lithography utilizing conformal deposition

Nanotechnology

Volumn 19, Issue 1, 2008, Pages

  Viheriälä, Jukka ^a   Rytkönen, Tuomo ^a   Niemi, Tapio ^a   Pessa, Markus ^a  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; DEPOSITION; GEOMETRY; LINEWIDTH; REFRACTIVE INDEX;

CONFORMAL DEPOSITION; LINEWIDTH TEMPLATES; ULTRAHIGH DENSITY MEMORY;

NANOIMPRINT LITHOGRAPHY;

NANOMATERIAL;

ARTICLE; CONFORMATION; COST; ELECTRON BEAM; FILM; GEOMETRY; NANOFABRICATION; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; PRIORITY JOURNAL; QUANTUM MECHANICS; REFRACTION INDEX; TARGET VARIABLE; ULTRAVIOLET RADIATION;

COST EFFECTIVENESS; DEPOSITION; GEOMETRY; LITHOGRAPHY; REFRACTIVITY;

EID: 36749043894     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/01/015302     Document Type: Article

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