Fabrication of a tungsten master stamp using self-ordered porous alumina

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1655-1659

  Choi, Jinsub ^a,c   Park, Young Bae ^b   Scherer, Axel ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b California Institute of Technology   (United States)

^c Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; FABRICATION; FRACTALS; LITHOGRAPHY; METALLIC FILMS; POROUS MATERIALS; SPUTTERING;

NANOTEMPLATES; POROUS ALUMINA; STRIP ANODIZATION; TUNGSTEN MASTER STAMP;

TUNGSTEN;

EID: 23444444470     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/042     Document Type: Article

References (24)

1. Martin C R 1994 Science 266 1961
2. Steinhart M, Wendorff J H, Greiner A, Wehrspohn R B, Nielsch K, Schilling J, Choi J and Gösele U 2002 Science 296 1997
3. Choi J, Sauer G, Nielsch K, Wehrspohn R B and Gösele U 2003 Chem. Mater. 15 776
4. Masuda H and Fukuda K 1996 Science 268 1466
5. Li A P, Müller F, Birner A, Nielsch K and Gösele U 1998 J. Appl. Phys. 84 6023
6. Masuda H, Yamada H, Satoh M, Asoh H, Nakao M and Tamamura T 1997 Appl. Phys. Lett. 71 2770
7. Li A P, Müller F and Gösele U 2000 Electrochem. Solid State Lett. 3 131
8. Mikulskas I, Juodkazis S, Tomasiunas R and Dumas J G 2001 Adv. Mater. 13 1574
9. Choi J, Nielsch K, Reiche M, Wehrspohn R B and Gösele U 2003 J. Vac. Sci. Technol. B 21 763
10. Liu N W, Datta A, Liu C Y and Wang Y L 2003 Appl. Phys. Lett. 82 1281
11. Sun Z J and Kim H K 2002 Appl. Phys. Lett. 81 3458
12. Masuda H, Yotsuya M, Asano M, Nishio K, Nakao M, Yokoo A and Tamamura T 2001 Appl. Phys. Lett. 78 826
13. Choi J, Sauer G, Göring P, Nielsch K, Wehrspohn R B and Gösele U 2003 J. Mater. Chem. 13 1100
14. Rabin O, Herz P R, Lin Y M, Akinwande A I, Cronin S B and Dresselhaus M S 2003 Adv. Funct. Mater. 13 631
15. Choi J, Wehrspohn R B and Gösele U 2003 Adv. Mater. 15 1531
16. Fournier-Bidoz S, Kitaev V, Routkevitch D, Manners I and Ozin G A 2004 Adv. Mater. 16 2193
17. www.matweb.com
18. Choi J, Wehrspohn R B, Lee J and Gösele U 2004 Electrochim. Acta 49 2645
19. Li F Y, Zhang L and Metzger R M 1998 Chem. Mater. 10 2470
20. Liu C Y, Datta A and Wang Y L 2001 Appl. Phys. Lett. 78 120
21. Choi J, Schilling J, Nielsch K, Hillebrand R, Reiche M, Wehrspohn R B and Gösele U 2002 Mater. Res. Soc. Symp. Proc. 722 L5.2
22. Tong W M and Williams R S 1994 Annu. Rev. Phys. Chem. 45 401
23. Family F and Vicsek T 1985 J. Phys. A: Math. Gen. 18 L75
24. Vazquez L, Salvarezza R C, Ocon P, Herrasti P, Vara J M and Arvia A J 1994 Phys. Rev. E 49 1507