Photoresist with low fluorescence for bioanalytical applications

Analytical Chemistry

Volumn 79, Issue 22, 2007, Pages 8774-8780

  Pai, Jeng Hao ^a   Wang, Yuli ^b   Salazar, Gina To'A ^a,c   Sims, Christopher E ^c   Bachman, Mark ^a,b   Li, G P ^a,b   Allbritton, Nancy L ^a,c  

^a University of California at Irvine   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c University of North Carolina at Chapel Hill   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; BIOMOLECULES; CELL ADHESION; FLUORESCENCE; MEMS; WAVELENGTH;

ADHERENT CELLS; BIOANALYTICAL DEVICES; LASER PULSE ENERGY;

PHOTORESISTS;

4,4' ISOPROPYLIDENEDIPHENOL; ANTIMONY; EPOXY RESIN;

ARTICLE; BIOMOLECULAR ELECTRONICS; CELL ADHESION; CELL SURFACE; CELL TYPE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; ENERGY ABSORPTION; FLUORESCENCE; MAXIMUM ALLOWABLE CONCENTRATION; MICROELECTROMECHANICAL SYSTEM; OPTICAL RESOLUTION; PHOTOGRAPHY; PHOTORESIST; SPECTRAL SENSITIVITY;

ANIMALS; CELL LINE; FLUORESCENT DYES; HUMANS; PHOTOCHEMISTRY; RATS; SULFONIUM COMPOUNDS;

EID: 36448996654     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac071528q     Document Type: Article

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