Close-packed noncircular nanodevice pattern generation by self-limiting ion-mill process

Nano Letters

Volumn 7, Issue 10, 2007, Pages 3246-3248

  Parekh, Vishal A ^a   Ruiz, Ariel ^a   Ruchhoeft, Paul ^a   Brankovic, Stanko ^a   Litvinov, Dmitri ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC RECORDING'; NONCIRCULAR NANODEVICES; PATTERNING TECHNIQUE; PRECURSOR ARRAYS;

ARGON; ELECTRON BEAMS; ION BEAM LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY;

NANOSTRUCTURED MATERIALS;

ARGON; ELECTRON BEAMS; LITHOGRAPHY;

ION; NANOMATERIAL; POLY(METHYL METHACRYLATE);

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; IONS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; POLYMETHYL METHACRYLATE; SURFACE PROPERTIES;

EID: 36248971260     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl071793r     Document Type: Article

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