Effects of manufacturing artifacts on infrared filter performance

Microwave and Optical Technology Letters

Volumn 48, Issue 9, 2006, Pages 1749-1754

  Qiang, Rui ^a   Chen, Ji ^a   Zhao, Tianxiao ^b   Han, Keping ^c   Ruiz, Ariel ^a   Ruchhoeft, Paul ^a   Morgan, Mark ^d  

^a UNIVERSITY OF HOUSTON   (United States)

^b INDIANA UNIVERSITY PURDUE UNIVERSITY FORT WAYNE   (United States)

^c AXCELIS TECHNOLOGIES   (United States)

^d EDTEK Inc   (United States)

Author keywords

Fabrication artifacts; FDTD method; Frequency selective surface; Infrared filter

Indexed keywords

FABRICATION ARTIFACTS; FDTD METHOD; FREQUENCY SELECTIVE SURFACE; INFRARED FILTER;

BANDWIDTH; FINITE DIFFERENCE METHOD; FREQUENCY SHIFT KEYING; PERFORMANCE; TIME DOMAIN ANALYSIS; WAVE TRANSMISSION;

MICROWAVE FILTERS;

EID: 33747186388     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/mop.21752     Document Type: Article

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