Illuminator optimization methods in microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5524, Issue , 2004, Pages 217-229

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Microlithography; Off axis illumination; OPC; RET; Source optimization

Indexed keywords

OFF-AXIS ILLUMINATION; OPC; RET; SOURCE OPTIMIZATION;

DIFFRACTIVE OPTICS; LEAST SQUARES APPROXIMATIONS; NONLINEAR SYSTEMS; OPTICAL DEVICES; OPTIMIZATION; STATIC RANDOM ACCESS STORAGE;

LITHOGRAPHY;

EID: 13444293202     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557011     Document Type: Conference Paper

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