SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 984-987

Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition

(2) Yang, Hangsheng a Yoshida, Toyonobu a

a UNIVERSITY OF TOKYO (Japan)

Author keywords

Cubic boron nitride; Hardness; ICP CVD; Nanoindentation; Recovery; Turbostratic boron nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; CUBIC BORON NITRIDE; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; HIGH RESOLUTION ELECTRON MICROSCOPY; INDENTATION; INDUCTIVELY COUPLED PLASMA; MECHANICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

NANOINDENTATION; TURBOSTATIC BORON NITRIDE;

THIN FILMS;

FILM;

EID: 24644503071 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.01.032 Document Type: Article

Times cited : (13)

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