Electron emission from nanocrystalline boron nitride films synthesized by plasma-assisted chemical vapor deposition

Diamond and Related Materials

Volumn 7, Issue 2-5, 1998, Pages 632-635

  Sugino, Takashi ^a   Tanioka, Kazuhiko ^a   Kawasaki, Seiji ^a   Shirafuji, Junji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Boron nitride; CVD; Electron emission; n Type doping; Si tip field emitter array

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); FILMS; NITRIDES; PLASMAS;

FOWLER-NORDHEIM PLOT;

ELECTRON EMISSION;

EID: 0031996235     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00289-6     Document Type: Article

References (14)

1. N.S. Xu, R.V. Latham, Y. Tzeng, Electron. Lett. 29 (1993) 1596.
2. K. Okano. K.K. Gleason, Electron. Lett. 31 (1995) 74.
3. J. Liu, V.V. Zhirnov, G.J. Wojak, A.F. Myers, W.B. Choi, J.J. Hren, S.D. Wolter, M.T. McClure, B.R. Stoner, J.T. Glass, Appl. Phys. Lett. 65 (1994) 2842.
4. V.V. Zhirnov, W.B. Choi, J.J. Cuomo, J.J. Hren, Appl. Surf. Sci. 94/95 (1996) 123.
5. R.J. Nemanich, P.K. Baumann, M.C. Benjamin, S.W. King, J. van der Weide, R.F. Davis, Diamond Relat. Mater. 5 (1996) 790.
6. R.W. Pryor, Appl. Phys. Lett. 68 (1996) 1802.
7. M.J. Rand, J.F. Roberts, J. Electrochem. Soc. 115 (1968) 423.
8. K. Nakamura, J. Electrochem. Soc. 133 (1986) 1120.
9. H. Saitoh, W.A. Yarbrough, Appl. Phys. Lett. 58 (1991) 2228.
10. G.L. Doll. J.A. Sell, C.A. Taylor, R. Clarke, Phys. Rev. B 43 (1991) 6816.
11. M. Murakawa, S. Watanabe, S. Miyake, Thin Solid Films 226 (1993) 82.
12. A. Bath, P.J. van der Put, J.G.M. Bechet, J. Schoonman, B. Lepley, J. Appl. Phys. 70 (1991) 4366.
13. T. Sugino, K. Tanioka, S. Kawasaki, J. Shirafuji, Jap. J. Appl. Phys. 36 (1997) L463.
14. F.J. Himpsel, J.A. Knapp, J.A. van Vechten, D.E. Eastman, Phys. Rev. B 20 (1979) 624.