Low-temperature growth of high-quality ZnO layers by surfactant-mediated molecular-beam epitaxy

Journal of Crystal Growth

Volumn 309, Issue 2, 2007, Pages 158-163

  Park, S H ^a   Suzuki, H ^a   Minegishi, T ^a   Fujimoto, G ^b   Park, J S ^a   Im, I H ^a   Oh, D C ^a   Cho, M W ^a   Yao, T ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

A1. Surfaces; A3. Molecular beam epitaxy; B1. Oxides

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALS; MOLECULAR BEAM EPITAXY; PHOTOLUMINESCENCE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUBSTRATES; SURFACE ACTIVE AGENTS; TWO DIMENSIONAL; X RAY DIFFRACTION;

HYDROGEN IRRADIATION; PLASMA ASSISTED MOLECULAR-BEAM EPITAXY;

ZINC OXIDE;

EID: 36048946385     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.09.020     Document Type: Article

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