Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Jonckheere, R ^a   Lorusso, G F ^a   Goethals, A ^a   Ronse, K ^a   Hermans, J ^a   De Ruyter, R ^a  

^a IMEC   (Belgium)

Author keywords

Blank; EUV; Flatness; Full field; Lithography; Mask making; Overlay; Reflectivity; Reticle; Shadowing; Substrate

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYERS; REFLECTION; SUBSTRATES; THERMAL EXPANSION;

MASK BLANK SUPPLIERS; MASK MAKING; MULTILAYER REFLECTIVITY CONTROL; SHADOWING;

MASKS;

EID: 35649023115     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.737179     Document Type: Conference Paper

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