Cleaning of MoSi multilayer mask blanks for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Kapila, Vivek ^a   Rastegar, Abbas ^a   Ikuta, Yoshiaki ^a   Eichenlaub, Sean ^a   Marmillion, Pat ^b  

^a SEMATECH   (United States)

^b IBM   (United States)

Author keywords

EUVL; Mask blank; MoSi; Multilayer cleaning

Indexed keywords

BRAGG MIRRORS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK BLANKS; MOSI; MULTILAYER CLEANING;

BRAGG CELLS; DEPOSITION; LITHOGRAPHY; MOLYBDENUM COMPOUNDS; SURFACE TREATMENT;

MULTILAYERS;

EID: 33846617369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686556     Document Type: Conference Paper

References (1)

1. P. Kearney, R. Randive, A. Ma, D. Krick, A. Weaver, I. Reiss, D. Abraham, P. Mirkarimi, and E. Spiller, "Overcoming substrate defect decoration effects in EUVL mask blank development," Proceedings of SPIE, 5567, 800-805, (2004).