EUV pellicle development for mask defect control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Shroff, Yashesh A ^a   Goldstein, Michael ^a   Rice, Bryan ^a   Lee, Sang H ^a   Ravi, K V ^a   Tanzil, Daniel ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUV; Pellicle; Reticle defect mitigation

Indexed keywords

LITHOGRAPHY; PRODUCT DEVELOPMENT; SEMICONDUCTOR DEVICE MANUFACTURE; SPECTROSCOPIC ANALYSIS; THIN FILMS; ULTRAVIOLET DEVICES;

DEVELOPMENTAL STUDIES; EUV LITHOGRAPHY; PELLICLE; RETICLE DEFECT MITIGATION;

MASKS;

EID: 33745631749     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656551     Document Type: Conference Paper

References (8)

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