Nucleation and growth of Ti2 AlN thin films deposited by reactive magnetron sputtering onto MgO(111)

Journal of Applied Physics

Volumn 102, Issue 7, 2007, Pages

  Beckers, M ^a   Schell, N ^a   Martins, R M S ^a   Mucklich A ^a   Moller W ^a   Hultman, L ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; MAGNETRON SPUTTERING; NUCLEATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

METASTABLE SOLID SOLUTIONS; REACTIVE MAGNETRON SPUTTERING; STOICHIOMETRY DEVIATIONS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 35348922269     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2786871     Document Type: Article

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