Deposition of Ti2AlC and Ti3AlC2 epitaxial films by magnetron sputtering

Applied Physics Letters

Volumn 85, Issue 6, 2004, Pages 1066-1068

  Wilhelmsson, O ^a   Palmquist, J P ^a   Nyberg, T ^a   Jansson, U ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; CRYSTAL ORIENTATION; ELASTIC MODULI; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; FILM GROWTH; HARDNESS; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; NUCLEATION; PEROVSKITE; RESISTORS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAZING INCIDENCE (GI) MODES; THERMAL SHOCKS; VACUUM CHAMBERS;

THIN FILMS;

EID: 4344675807     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1780597     Document Type: Article

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