Enhanced light extraction from nanoporous surfaces of InGaN/GaN-based light emitting diodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 10 A, 2007, Pages 6682-6684

  Kim, Keunjoo ^a   Choi, Jaeho ^a   Bae, Tae Sung ^b   Jung, Mi ^c   Woo, Deok Ha ^c  

^a Chonbuk National University   (South Korea)

^b Korea Basic Science Institute (KBSI)   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

Anodic aluminum oxide; Inductively coupled plasma dry etching; Nanoporous GaN surface; Photoluminescence

Indexed keywords

ALUMINUM COMPOUNDS; ELECTROLYTES; GALLIUM NITRIDE; INDUCTIVELY COUPLED PLASMA; LIGHT EMISSION; NANOSTRUCTURED MATERIALS;

ANODIC ALUMINUM OXIDES; INDUCTIVELY COUPLED PLASMA DRY ETCHING; MULTI-QUANTUM-WELL (MQW) DIODES;

LIGHT EMITTING DIODES;

EID: 35348875974     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6682     Document Type: Article

References (16)

1. T. Fujii, Y. Gao, R. Sharma, E. L. Hu, S. P. DenBaars, and S. Nakamura: Appl. Phys. Lett. 84 (2004) 855.
2. R. A. Oliver, G. A. D. Briggs, M. J. Kappers, C. J. Humphreys, S. Yasin, J. H. Rice, J. D. Smith, and R. A. Taylor: Appl. Phys. Lett. 83 (2003) 755.
3. O. Moriwaki, T. Someya, K. Tachibana, S. Ishida, and Y. Arakawa: Appl. Phys. Lett. 76 (2000) 2361.
4. E. Yablaonovitch and T. J. Gmitter: Phys. Rev. Lett. 63 (1989) 1950.
5. J. D. Joannopoulos, R. D. Meade, and J. N. Winn: Photonic Crystals: Molding the Flow of Light (Princeton Univ. Press, Princeton, 1995) p. 35.
6. I. G. Lee, K. Kim, S. C. Jeon, J. S. Kim, and H. M. Lee: Int. J. Precis. Eng. Manuf. 7 (2006) No. 4, 14.
7. K. Kim, J. Choi, S. C. Jeon, J. S. Kim, and H. M. Lee: Appl. Phys. Lett. 90 (2007) 181115.
8. X. Lie, Y. W. Kim, P. W. Bohn, and I. Adesida: Appl. Phys. Lett. 80 (2002) 980.
9. C. F. Lin, J. H. Zheng, Z. J. Yang, J. J. Dai, D. Y. Lin, C. Y. Chang, Z. X. Lai, and C. S. Hong: Appl. Phys. Lett. 88 (2006) 083121.
10. A. Yamamoto, Y. Tsuji, T. Sugiura, and A. Hashimoto: Jpn. J. Appl. Phys. 38 (1999) 2619.
11. M. Ohkubo: Jpn. J. Appl. Phys. 36 (1997) L955.
12. K. Kim and K. N. Jeon: Jpn. J. Appl. Phys. 46 (2007) 131.
13. K. Kim, J. Y. Lee, and S. C. Jeoung: Thin Solid Films 478 (2005) 286.
14. M. Jung, H. L. Park, and S. I. Mho: Appl. Phys. Lett. 88 (2006) 133121.
15. W. Peng and Y. C. S. Wu: Appl. Phys. Lett. 89 (2006) 041116.
16. J. C. Zhang, D. S. Jiang, Q. Sun, J. F. Wang, Y. T. Wang, J. P. Liu, J. Chen, R. Q. Jin, J. J. Zhu, H. Yang, T. Dai, and Q. J. Jia: Appl. Phys. Lett. 87 (2005) 071908.