Impact of downstream ash plasmas on ultra low-k materials

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 337-340

  Posseme N ^a   David, T ^b   Meininger, P ^c   Louveau, O ^a   Chevolleau, T ^b   Joubert, O ^b   Louis, D ^c  

^a STMICROELECTRONICS   (France)

^b CNRS   (France)

^c CEA LETI   (France)

Author keywords

Ash; BEOL; Downstream plasmas; Effectiveness; Porous ultra low k

Indexed keywords

EID: 36049026217     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.337     Document Type: Conference Paper

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