Electrochemical properties of V2O5 thin films deposited by spin coating

Materials Science and Engineering: B

Volumn 143, Issue 1-3, 2007, Pages 42-50

  Sahana, M B ^a   Sudakar, C ^a   Thapa, C ^a   Lawes, G ^a   Naik, V M ^b   Baird, R J ^a   Auner, G W ^c   Naik, R ^a   Padmanabhan, K R ^a  

^a WAYNE STATE UNIVERSITY   (United States)

^b UNIVERSITY OF MICHIGAN DEARBORN   (United States)

^c Wayne State University   (United States)

Author keywords

Electrochemical properties; Raman spectroscopy; Stoichiometry in V2O5 films; Vanadium pentoxide thin films

Indexed keywords

ELECTROCHEMICAL PROPERTIES; RAMAN SPECTROSCOPY; SOL-GEL PROCESS; SPIN COATING; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CARBON CONTENT; NON STOICHIOMETRIC FILM; VANADIUM PENTOXIDE THIN FILMS;

THIN FILMS;

EID: 35348843335     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.08.002     Document Type: Article

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