Thin films of vanadium oxide grown on vanadium metal: Oxidation conditions to produce V2O5 films for Li-intercalation applications and characterisation by XPS, AFM, RBS/NRA

Surface and Interface Analysis

Volumn 38, Issue 1, 2006, Pages 6-18

  Lindström, Rakel ^a,c   Maurice, Vincent ^a   Zanna, Sandrine ^a   Klein, Lorena ^a   Groult, Henry ^a   Perrigaud, Laurent ^a   Cohen, Camille ^b   Marcus, Philippe ^a  

^a SORBONNE UNIVERSITÉ   (France)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

^c UNIVERSITY OF ULM   (Germany)

Author keywords

AFM; Lithium intercalation; NRA; Oxygen dissolution; RBS; Thermal oxidation; Vanadium; Vanadium oxide; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERCALATION COMPOUNDS; OXIDATION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LITHIUM INTERCALATION; NRA; OXYGEN DISSOLUTION; RBS; THERMAL OXIDATION;

VANADIUM COMPOUNDS;

EID: 30644470717     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2141     Document Type: Article

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