Fuzzy CDs: Show me the edges!

Microlithography World

Volumn 13, Issue 1, 2004, Pages

  Ford, Arnie ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LINEWIDTH VARIATION (LWV); MEASUREMENT ACCURACY;

ALGORITHMS; COMPUTER SOFTWARE; CORRELATION METHODS; DATA REDUCTION; EDGE DETECTION; FAULT TOLERANT COMPUTER SYSTEMS; FEATURE EXTRACTION; LITHOGRAPHY; PROCESS ENGINEERING; SCANNING ELECTRON MICROSCOPY; STANDARDS; TUNGSTEN; WSI CIRCUITS;

FUZZY SETS;

EID: 1642394965     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (4)

1. CD-SEM supplier default measurement parameters generally give a measurement close to the widest (narrowest) part of the line (space or hole), which are usually found at the bottom of the feature.
2. Mike Cresswell at National Institute of Standards and Technology (NIST) is developing a Single Crystal CD Reference Material. Details are available in: M. Cresswell, H. Bogardus, J. Martinez de Pinillos, M. Bennett, R. Allen, et al., "CD Reference Materials for Sub-Tenth Micrometer Applications," SPIE Proceedings, Metrology, Inspection, and Process Control for Microlithography XVI, Vol. 4689, pp 116-127, 2002.
3. Benjamin Bunday of International SEMATECH, and Ron Dixson, NIST Guest Researcher at International SEMATECH, along with the Advanced Metrology Advisory Group (AMAG), are developing a Reference Measurement System for SEMATECH Member Companies. Details are available in: R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System Using CD-AFM," SPIE Proceedings, Metrology, Inspection, and Process Control for Microlithography XVII, Vol. 5038, pp 150-165, 2003; and R. Dixson, A. Guerry, M. Bennett, T. Vorburger, M. Postek, "Toward Traceability for At Line AFM Dimensional Metrology," SPIE Proceedings, Metrology, Inspection and Process Control for Microlithography XVI, Vol. 4689, pp. 313-335, 2002.
4. Benjamin Bunday of International SEMATECH, and Ron Dixson, NIST Guest Researcher at International SEMATECH, along with the Advanced Metrology Advisory Group (AMAG), are developing a Reference Measurement System for SEMATECH Member Companies. Details are available in: R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System Using CD-AFM," SPIE Proceedings, Metrology, Inspection, and Process Control for Microlithography XVII, Vol. 5038, pp 150-165, 2003; and R. Dixson, A. Guerry, M. Bennett, T. Vorburger, M. Postek, "Toward Traceability for At Line AFM Dimensional Metrology," SPIE Proceedings, Metrology, Inspection and Process Control for Microlithography XVI, Vol. 4689, pp. 313-335, 2002.