Fine Pixel CD-SEM for Measurements of Two-dimensional Patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 607-618

  Yamaguchi, Shinji ^a   Itoh, Masamitsu ^a   Ikeda, Takahiro ^a   Miyano, Yumiko ^a   Mitsui, Tadashi ^a   Amma, Masuo ^b   Horikawa, Shoichi ^b  

^a TOSHIBA CORPORATION   (Japan)

^b TOPCON CORPORATION   (Japan)

Author keywords

CD SEM; OPC; Pixel size; Repeatability; Two dimensional patterns

Indexed keywords

ALGORITHMS; IMAGE PROCESSING; IMAGE QUALITY; MASKS; SCANNING ELECTRON MICROSCOPY;

CD-SEM; PIXEL SIZE;

PATTERN RECOGNITION;

EID: 1842579631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518289     Document Type: Conference Paper

References (1)

1. T. Ikeda, Y. Miyano, T. Kotani, T. Shibata and O. Ikenaga, "OPC pattern measurement using SEM image" Jpn. J. Appl. Phys., vol. 42, no. 6B, pp 3937-3941, 2003.