Comparison of resist outgassing at wavelengths from 193nm to 13nm

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 1066-1075

  Domke, Wolf Dieter ^a   Kragler, Karl ^a   Kern, Marion ^a   Lowack, Klaus ^a   Kirch, Oliver ^b   Bertolo, Michele ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c SINCROTRONE TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CORRELATION METHODS; DEGASSING; DIFFUSION; MASS SPECTROMETERS; PHOTOLITHOGRAPHY; PHOTONS; ULTRAVIOLET RADIATION;

PHOTOACID GENERATOR (PAG); POLYMER MATRIX; RESIST DIMENSION; TIME DEPENDED SCANNING;

PROTECTIVE COATINGS;

EID: 24644517494     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599543     Document Type: Conference Paper

References (6)

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5. H. Cao, W. Yueh, V. Thirumala, H.Choi; Proc 3rd Int. EUV Symp., Miyazaki (2004)
6. W.-D. Domke, M. Kern, K. Kragler, K. Lowack, O. Kirch, M. Bertolo, P. Lacovig, L. Rumiz; Proc 3rd Int. EUV Symp., Miyazaki (2004)