Resist outgassing by EUV irradiation

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 555-560

  Watanabe, Takeo ^a   Hamamoto, Kazuhiro ^a   Kinoshita, Hiroo ^a   Tsubakino, Harushige ^a   Hada, Hideo ^b   Komano, Hiroshi ^b   Endo, Masayuki ^c   Sasago, Masaru ^c  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

^c ULSI Process Technology Development Center   (Japan)

Author keywords

Chemically amplified resist; Contamination; EUVL; Outgassing

Indexed keywords

ARTICLE; CHEMICAL REACTION; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; MASS SPECTROMETRY; MEASUREMENT; PHOTOCHEMISTRY; PRESSURE; THICKNESS; ULTRAVIOLET IRRADIATION;

EID: 0035747029     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.555     Document Type: Article

References (6)

1. HANDBOOK of microlithography, micromachining, and microfabrication volume 1; microlithography