Virtual OPC at hyper NA lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Lee, Sook ^a   Kim, Sang Wook ^a   Chun, Yong Jin ^a   Suh, Sung Soo ^a   Jang, Yun Kyeong ^a   Lee, Suk Joo ^a   Choi, Sung Woon ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Hyper NA; Simulation accuracy; Virtual OPC

Indexed keywords

LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; VIRTUAL REALITY;

CRITICAL DIMENSION; SIMULATION ACCURACY;

OPTICAL SYSTEMS;

EID: 35048815554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711827     Document Type: Conference Paper

References (13)

1. M. D. Smith, "Methods for Benchmarking Photolithography Simulators", Proceeding of SPIE, vol. 5040, pp.57-68, 2003.
2. J. Tirapu-Azpiroz, "Boundary layer model to account for thick mask effects in photolithography", Proceeding of SPIE, vol. 5040, pp. 1611-1619, 2003.
3. M. Smith, "The impact of mask topography on binary reticles at the 65nm node", Proceedings of SPIE, vol.5754, pp. 527-536, 2005.
4. A. Erdmann, "Mask and wafer topography effects in immersion lithography", Proceedings of SPIE, vol. 5754, pp. 383-394, 2005.
5. A. Erdmann, "Mask modeling in the low kl and ultrahigh NA regime:phase and polarization effects", Proceedings of SPIE, vol. 5835, pp. 69-81, 2005.
6. K. Adams, "Simplified models for edge transitions in rigorous mask modeling", Proceedings of SPIE, vol. 4346, pp. 331-344, 2001.
7. K. Adams, "Modeling of electromagnetic effects from mask topography at full-chip scale", Proceedings of SPIE, vol. 5754, pp. 498-505, 2005.
8. T. V. Pistor, "Accuracy Issues in the finite difference time domain simulation of photomask scattering", Proceedings of SPIE, vol.4346, pp. 1484-1491, 2001.
9. S. Lee, "Mask topography effect on OPC at hyper-NA lithography", Proceedings of SPlE, vol.6154, 6154R-1, 2006.
10. T. B. Chiou, "How to obtain accurate resist simulations in very low-kl era?", Proceedings of SPIE, vol.6154, 61542 V-1, 2006.
11. S. P. Renwick, "Characterizing a scanner illuminator for prediction of OPE effects", Proceedings of SPIE, vol.6154, 61540O-1, 2006.
12. A. R. Neureuther, "Simulation of image quality issues at low k1 for 100-nm lithography", Proceedings of SPIE, vol.4409, 2001.
13. B. W. Smith, "Challenges in high NA, polarization, and photoresists", Proceedings of SPIE, vol. 4691, p.11, 2002.