Characterizing a scanner illuminator for prediction of OPE effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Renwick, Stephen P ^a   Nishinaga, Hisashi ^b   Kita, Naonori ^b  

^a NIKON PRECISION INC   (United States)

^b NIKON CORPORATION   (Japan)

Author keywords

Coherence; Effective; Illuminator; Iso dense bias; NA; OPC; OPE; Pupil; Sigma

Indexed keywords

EFFECTIVE; ILLUMINATOR; ISO-DENSE BIAS; OPTICAL PROXIMITY EFFECT (OPE); PUPIL; SIGMA;

COHERENT LIGHT; LENSES; NUMERICAL ANALYSIS; PHOTOLITHOGRAPHY; TRANSFER FUNCTIONS;

OPTICAL SYSTEMS;

EID: 33745770843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656810     Document Type: Conference Paper

References (12)

1. T. A. Brunner, "Impact of lens aberrations on optical lithography," IBM Journal of Research and Development 41, p. 57 - 67 (Jan/Mar 1997).
2. D.G. Flagello and B. Geh, "The influence of lens aberrations in lithography," Microlithography World (Winter 1998) p. 11 - 16.
3. J.P.Kirk and C.J.Progler, "Pupil illumination: in-situ measurement of partial coherence," Optical Microlithography XI, L. Van den Hove, ed., Proceedings of SPIE 3334, p. 281 - 288, 1998.
4. G.Zhang, C.Wang, C.Tan, J.Ilzhoefer, C.Atkinson, S.P.Renwick, S.D.Slonaker, D.Godfrey, and C.Fruga, "Illumination pupil fill measurement and analysis and its application in scanner V - H bias characterization for 130nm node and beyond," Optical Microlithography XVI, A. Yen, ed., Proceedings of SPIE 5040, p. 45-56, 2003.
5. S.P. Renwick, "What makes a coherence curve change?", Optical Microlithography XVIII, B.W. Smith, ed., Proceedings of SPIE 5754, p. 1537 - 1547, 2005.
6. T.C. Barrett, "Impact of illuminator pupil-fill on simulated imaging performance," Optical Microlithography XIII, C.J. Progler, ed., Proceedings of SPIE 4000, p. 804 - 817, 2000.
7. S. P. Renwick, "Scanner parameters and OPE variation," presented at FujiFilm INTERFACE conference, San Diego, Sept. 2005; to be published.
8. C. Bodenhorf, R.E. Schlief, and R. Ziebold, "Impact of measured pupil illumination fill distribution on lithography simulation and OPC models," Optical Microlithography XVII, B.W. Smith, ed., Proc. SPIE 5377, p. 1130 - 1145, SPIE, March 2004.
9. T. Heil, P. Gräupner, R. Garreis, R. Egger, M. Brotsack, J. Finders, and S. Hansen, "Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications," Optical Microlithography XVII, B.W. Smith, ed., Proc. SPIE 5377, p. 344 - 356, SPIE, March 2004..
10. This is well-known, of course, but useful references are: chapter 2 of A.K. Wong, Resolution Enhancement Techniques in Optical Lithography, SPIE, Bellingham, Washington, 2001;
11. A. R. Neureuther and C.A. Mack, "Optical Lithography Modeling," Chapter 7 in Handbook of Microlithography, Micromachining, and Microfabrication: Volume 1, P. Rai-Choudhury, ed., SPIE, Bellingham, Washington, 1997.
12. Another frequently-discussed topic, with a useful reference: H.J. Levinson and W.H. Arnold, "Optical Lithography," Chapter 1 in Handbook of Microlithography, Micromachining, and Microfabrication: Volume 1, P. Rai-Choudhury, ed., SPIE, Bellingham, Washington, 1997.